In an n-type semiconductor, the Fermi level lies 0.5 eV below
the conduction band. If the...
In an n-type semiconductor, the Fermi level lies 0.5 eV below
the conduction band. If the conduction of donor atoms is tripled,
find the new position of the Fermi level, given KT = 0.03 eV.
The fermi function value is non zero within the band gap of a
semiconductor. if the fermi level is within the band gap. Do you
expect electrons or holes to populate
energy states within the band gap? If yes, why? If not, why?
Doping changes the Fermi energy of a semiconductor. Consider
silicon, with a gap of 1.11 eV between the top of the valence band
and the bottom of the conduction band. At 300 K the Fermi level of
the pure material is nearly at the midpoint of the gap. Suppose
that silicon is doped with donor atoms, each of which has a state
0.13 eV below the bottom of the silicon conduction band, and
suppose further that doping raises the Fermi...
A simple insulator has a band gap of 4.0 eV, and the Fermi
energy may be taken to reside in the middle of the gap. Estimate
the probability of an electron at room temperature being in the
conduction band.
Solar cell A uses a semiconductor with a band gap of 1.1 eV.
Solar cell B uses a semiconductor with a band gap of 2.0 eV. Either
cell is thick enough to absorb all the light above its band gap
energy. Both cells can work together simultaneously with one on top
of the other to operate more efficiently in a small space. But
which cell has to be on top (first to receive sunlight) for both to
work simultaneously and...
Assume Silicon (bandgap 1.12 eV) at room temperature (300 K)
with the Fermi level located exactly in the middle of the bandgap.
Answer the following questions.
a) What is the probability that a state located at the bottom of
the conduction band is filled?
b) What is the probability that a state located at the top of
the valence band is empty?
N-type silicon is doped with
phosphorus, and the ionization potential of phosphorus is 0.044
eV.
Find the Fermi level position and
concentration at room temperature when the impurity is half
ionized.
Given a MOS capacitor on an n-type semiconductor (relative
permittivity =10, ND= 1E13 cm-3)and using an unknown gate
dielectric (relative permittivity εr=25). Sketch the C-V plot and
label the accumulation, depletion, inversion regions, and the
approximate location of the flatband and threshold voltages.
Calculate the dielectric thickness and the depletion width in
inversion given that the high-frequency capacitance is 250 nF/cm^2
in accumulation and is 50 nF/cm^2 at onset of strong inversion
(where minimum capacitance exists).
[Ans: dielectric thickness: 88.5...