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The first step in the production of high purity silicon for semiconductors is represented by this equation. SiO2(s) + 2C(s) → Si(s) + 2CO(g) H° = +689.9 kJ
a. Calculate Hf° for SiO2(s). Given: Hf° for CO(g) = –110.5 kJ·mol–1
b. Find Srxn for the production of pure silicon. Given: S° for C(s) = 5.7 J·K–1 ·mol–1 , for CO(g) is 197.6 J·K–1 ·mol–1 , for Si(s) = 18.8 J·K–1 ·mol–1 , and for SiO2(s) = 41.8 J·K–1 ·mol–1
c. Determine G° for the reaction at 25 °C.
d. Find the minimum temperature in °C at which this reaction is spontaneous. Assume that H° and S° do not vary with temperature.