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Basic semiconductor process lab. 2. whn do you use the following solution? a) BOE b) Developer

Basic semiconductor process lab.

2. whn do you use the following solution?
a) BOE
b) Developer

Solutions

Expert Solution

a)

Buffered oxide etch (BOE) is used to remove SiO2. BOE is a very selective etchant, meaning that
it stops at Silicon and does not etch further. This etch may be used in a number of steps. BOE
can be used at the beginning of the process to define holes in the thermally grown oxide to
fabricate contacts with the Silicon substrate. BOE can also be used to define contact (via) by
etching the Spin on glass layer.

The BOE etch process is based on the following reaction:

SiO2 + 6HF → H2SiF6 + 2H2O

where H2SiF6 is soluble in water.
A buffering agent, ammonium fluoride (NH4F) is also added to the solution to maintain HF
concentration and to control pH (to minimize photoresist attack):

Buffering reaction: NH4F ↔ NH3 + HF

b) Developer Solution is used in the darkroom for developing (i.e. converting latent image to visible image) x-ray films used in conventional (screen film) radiography.

  • Components:
  • developer: hydroquinone (for high contrast) + Metol or phenidone (for low contrast)

genius_generous answered 2 years ago
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