If the "lift-off" process is used for the metal electrode patterning, choose a photoresist and photomask...

If the "lift-off" process is used for the metal electrode patterning, choose a photoresist

and photomask polarity from the list below. Justify your choice. (4 points)

Photoresist inventory: (1) Shipley 1827, (2) SU-8 2005, (3) Futurrex NR9-8000, (4) Dry film PR

Photomask polarity: (1) Clear field (Bright field), (2) Dark field

Expert Solution

i) photo resist is a photosensitive material being used in industries related to micro electronics. The photo resist are absorbed on the surface of the substrate. The photo resist polarity preferred here would be dry film PR due to to their application in micro electro mechanical system also known as MEMS. It was designed around 30years ago and would be the best photo resist if the lift off process is being used for the electrode plattering. Adhesion is not an issue for dry film and here adhesive property would work as photo resists sticks on the substrate surface using their adhesive property.

ii) The photomasks are chrome coated and lithographic glass templates. These are designed to optically transfer patterns. So photomask polarity used here should be dark field as the electron plattering would be opaque in nature so we need a clear background and it is being obtained by the dark field photomask. The procedure of using of photomask is that it should be used by the opposite nature of background pattern required by us.

Ally Wells answered 6 months ago

1. Why are the pre-bake and post-bake steps used in the photoresist process sequence 2. Why...

1. Why are the pre-bake and post-bake steps used in the photoresist process sequence 2. Why do we keep calcium gluconate in the laboratory?? 3. Why are the overhead lights in the lithography room yellow??

A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing...

A new process has been developed for applying photoresist to 125-mm silicon wafers used in manufacturing integrated circuits. Ten wafers were tested, and the following photoresist thickness measurements (in angstroms x1000) were observed: 13.3987, 13.3957, 13.3902, 13.4015, 13.4001, 13.3918, 13.3965, 13.3925, 13.3946, and 13.4002. (a) Test the hypothesis that mean thickness is 13.4 x 1000Å. Use = 0.05 and assume a two sided alternative. (b) Find a 99% two-sided confidence interval on mean photoresist thickness. Assume that thickness is normally...

Ag/AgCl electrode, saturated KCl used as electrolyte. In Hg2Cl2 (reference electrode), Hg/Hg2Cl2 used as electrode, 1M...

Ag/AgCl electrode, saturated KCl used as electrolyte. In Hg2Cl2 (reference electrode), Hg/Hg2Cl2 used as electrode, 1M saturated KCl used as electrolyte. Their standard half-cell potentials are E0S=+0.223V and E0R=+0.268V, respectively. They are combined to form a full cell for concentration sensing, i.e., as a concentration cell. 1) What type of electrode will it be (potenometry or amperometry)? 2) What is the anticipated output value from the sensor if the sampled solution has 1M concentration? (T=250C). 3) If the output value...

what is the difference between electrode and filler in welding process?how do you select proper electrode...

what is the difference between electrode and filler in welding process?how do you select proper electrode and filler in your process?

The process most widely used to make fully-dense parts in metal or polymer is…?

A. The process most widely used to make fully-dense parts in metal or polymer is…? Group of answer choices a. Powder Bed Fusion - liquid phase sintering b. Electron-beam melting c. Sheet Lamination d. Powder Bed Fusion - melting B. The most widely used “drop on demand” AM method… Group of answer choices a. uses thermal energy to generate pressure which produces droplets b. uses pressure injectors to generate pressure which produces droplets c. uses centrifugal force to generate...

Information for Problems 1 - 5: Photoresist is a light sensitive material used in industrial processes...

Information for Problems 1 - 5: Photoresist is a light sensitive material used in industrial processes like photolithography and photoengraving to form a patterned coating on a surface. There are two types of photoresists: positive and negative. A positive photoresist is one in which the portion of the photoresist that is exposed to light becomes soluble to the photoresist developer. A negative photoresist is one in which the portion of the photoresist that is exposed to light becomes insoluble to...

Angel's Garage is paying off a new car lift in three annual installments of $900, with...

Angel's Garage is paying off a new car lift in three annual installments of $900, with an interest rate of 6.5% compounded annually. Payments are made each August. Explain what Angel's will have paid in total, after all three payments are made. Show all calculations. Explain what would be different if interest were compounded monthly. If Angel's Garage gets the opportunity to refinance the payment plan at 6.45% interest which compounds monthly after the first payment but before the second,...

Lift Dentistry Services operates in a large metropolitan area. Lift has its own dental laboratory used...

Lift Dentistry Services operates in a large metropolitan area. Lift has its own dental laboratory used to produce porcelain and gold crowns. The per unit variable costs to produce these crowns are: porcelain ....... $81 per crown gold ............ $115 per crown Fixed overhead includes the following: porcelain gold supervisor's salary $15,000 $20,000 allocated general overhead $ 6,000 $ 6,000 A local dental laboratory has offered to supply Lift all the crowns it needs. Its price is $100 per porcelain...

Choose an isotope and describe its radioactive decay process and how it is used

6. In all vertebrate embryos, the process of gastrulation accomplishes the following important function(s): a) Patterning...

6. In all vertebrate embryos, the process of gastrulation accomplishes the following important function(s): a) Patterning the anterior-posterior axis (TRUE/FALSE) b) Bringing mesodermal cells into the interior of the embryo (TRUE/FALSE) c) Bringing ectodermal cells into the interior of the embryo (TRUE/FALSE)

Question